SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry.
Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.
SENTECH’s motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.
The SI 500 represents the leading edge for ICP processing in research and production. Flexibility and modularity are design cha racteristics of the SENTECH SI 500. A wide range of etch processes including III-V compounds (e.g. GaAs, InP, GaN, InSb.), dielectrics, quartz, glass, silicon and silicon compounds (SiC, SiGe) are available.
The SENresearch 4.0 covers the widest spectral range from 190 nm to 3500 nm and the highest spectral resolution in the NIR by FTIR ellipsometry.
The Step Scan Analyzer (SSA) principle is a unique feature of the SENresearch 4.0. The field upgradeable 2C design allowsfull Mueller matrix measurement. The SENresearch 4.0 comes with SpectraRay/4 – SENTECH comprehensive software for ellipsometry data acquisition and analysis.
Optical coating in the nanometer-scale requires a high level of accuracy regarding layer properties such as thickness, composition, conformality and stress control.
In order to ensure an excellent uniformity and conformality in layer-thickness, atomic layer deposition (ALD) is used for depositing optical thin films applied as e.g. anti-reflective coatings or optical filter systems. SENTECH uses the advantages of the Planar Triple Spiral Antenna (PTSA) ICP source in ICPEALD processing.
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