OTTELIA is an innovative solution for removing silicon dioxide (SiO2) particles from process wastewater - especially from wet-chemical cleaning and etching processes in semiconductor manufacturing.

The system reliably removes even the finest particles from the wastewater and thus creates the conditions for safe recycling of the treated water for reuse in waste gas purification.

Maximum Efficiency for Your Wastewater Treatment

Benefit from:

• Adaptable to different volume flows and particle sizes

• Compact plug-and-play unit

• High system efficiency enables direct water reuse

• Guaranteed process reliability

• Integrated control and measurement technology

• Reduced fresh water consumption and waste water volume

• Contribution to sustainable water management in semiconductor production